Description: Produces a clean polished cross section of almost any material at 90 degrees to the sample surface--ideal for measurement of multilayered structures. Useful for difficult-to-polish soft materials (Cu, Al, Au, solder, polymers) as well as difficult-to-cut hard materials (ceramic, glass, Si) and composites.

Contact Person: Scott Payne

Department: RCA Electron Microscopy Core

Building: USDA Northern Crop Science Laboratory

Room:

Availability: Available - Recharge Center